EUV Lithography

EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field. 1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood

2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm

3. EUV Source Technology / Vivek Bakshi

4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor

4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli

4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli

4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt

5. EUV Optical Testing / Kenneth A. Goldberg

6A. Optics Contamination / Saša Bajt

6B. Grazing Angle Collector Contamination / Valentino Rigato

6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava

7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn

8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard

9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower

10. Fundamentals of the EUVL Scanner / Kazuya Ota

11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok

12. Lithography Cost of Ownership / Phil Seidel

Appendix: Example Case Studies of Lithography CoO Calculations

Vivek Bakshi is the President of EUV Litho, Inc. He was previously a senior member of the technical staff of Sematech, Inc.
Dr. Bakshi studied at the University of Texas at Austin; the University of Idaho; and the Indian Institute of Technology at Kanpur.